1. Technical data on investigated fabrics and their enlarged photographs
The micrographs of the fabric (Fig. S1, S2, S3) were done with use of scanning electron microscope PHILIPS XL30.
The samples were prepared by sputtering a thin layer of platinum to assure the electrical conductivity.
Fabric I: Manufactured by NBC INDUSTRUIES CO., LTD, 2-50-3 Toyoda, Hino, Tokyo 191, Japan.
|Symbol||TL 59M/150||click to enlarge|
Fig. S1. Photograph of fabric I
|Type of fabric||polyester monofilament screen|
|Type of weave||plain weave 1:1|
|Mesh (number of threads)|| 150 per inch, 59 per cm |
|Basic period||d = 25400 μm/150 = 169 μm|
|Mesh opening|| (size of the pore) w = 118 μm|
|Open area||49 %|
Fabric II: Manufacturer and symbol undetermined.
The data given below are derived from diffraction experiments (d) and electron microscope photographs.
|Type of fabric||polyester monofilament screen||click to enlarge|
Fig. S2. Photograph of fabric II
|Type of weave||twill 1:2|
|Basic period||d = 67 μm|
|Mesh opening (size of the pore)||w = 27 μm|
|Open area||16 %|
Fabric III: Produced by Sefar Holding Inc., Freibach, CH - 9425 Thal, Switzerland
All data given in table are quoted from the company leaflet (available at www.sefar.com)
|Symbol||PET 1000 190/480-31W TW||click to enlarge|
Fig. S3. Photograph of fabric III
|Type of weave twill|| 2:2|
|Mesh (number of threads)|| 190 per cm or 480 per inch|
|Basic period|| d = 25400 μm/480 = 53 μm|
|Mesh opening (size of the pore)|| 16 μm|
|Thread diameter nominal|| 31 μm|
|Open area|| 9 %|
|Fabric thickness|| 55 μm ( ± 3 μm)|
|Area weight|| 41 g/m2|